FEO MAGAZINE - February |
A couple of things that we would like to mention in this issue: First, we are pleased to welcome our newest panel member, Geomatrix Senior Scientist Julia Bussey. We look forward to her direction and comments in this and in subsequent issues. Additionally, joining our current partners FOA and ISMI, we are pleased to announce our newest partner in FEO magazine – Surplus Equipment Consortium / Network, Inc. (SEC/N®) the semiconductor industry’s global trade association for secondhand equipment and related services – we are looking forward to our new collaboration.
Take a look below to see what you’ll find in this issue of FEO magazine. Our goal is to cover some of the most important day-to-day operational issues that you are facing and hopefully provide you with inspiration and education. So don’t hesitate to let us know what else you would like us to include – we look forward to your feedback!
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In this issue:
Business Infrastructure
INTRODUCTION: Business Infrastructure The Business Infrastructure section of the
February issue of FEO focuses on the growing
need for equipment manufacturers to pay
attention to the 200 mm fabs’ needs. While it
is exciting to be at the bleeding edge of technology,
it is apparent that, business-wise, many
manufacturers, as well as products companies,
are better off focusing on and expanding in
the more mature 200 mm technologies.
Where Is the Innovation on 200 mm Silicon? The concentration of money chasing the
ITRS roadmap overshadows the myriad
efforts happening in many 200 mm fabs
worldwide. Conventional wisdom holds that
the challenges of sub-65nm devices make
300 mm wafers “where the action is,” so
why bother investing in 200 mm innovation?
We see a different picture: 200 mm silicon
has plenty of innovation life left. We will
describe some areas of innovation and
implications for continued investment in
200 mm development.
200 mm Fabs Have a Long and Promising Future! The semiconductor industry has been
following Moore’s Law for the past four
decades. With the progress to smaller
geometries came, also, the increase in wafer
size. In the past five years, leading manufacturers
underwent transition from 200 to
300 mm wafers.
Asset Utilization
INTRODUCTION: Asset Utilization The Asset Utilization section has two
articles that I can relate to: “Used Equipment:
Organization 101+” and “Installing 8-inch
Equipment in a 6-Inch-Generation Fab:
Equipment Move-in.” An example for both
occurred at Cypress Semiconductor.
Installing 8-inch Equipment in a 6-Inch-Generation Fab: Equipment Move-in Installing 8-inch equipment in a semiconductor
fab with 6-inch equipment can be a
viable option to increase production capacity
or to produce higher-technology devices.
However, fabs in the 6-inch generation may
not be designed to accommodate the larger
and heavier 8-inch tools, making it difficult
to move the equipment into the fab. In such
cases, building an elevated platform to raise
the equipment to fab level and then using
an air-bearing move-in system can provide
a solution.
Used Equipment: Organization 101+ No curriculum in Business Administration
101 would be complete without studying the
classic functions of management: planning,
organizing, coordinating, directing and controlling.
Unfortunately, the market for secondhand
equipment is not very traditional,
especially when it comes to organization.
Fab Productivity
INTRODUCTION: Fab Productivity 1 This year the semiconductor industry is
experiencing a slowdown with many of the
IDMs and foundries cutting back on capital
expenditures. Cost reduction is uppermost on
the minds of fab management today. This FEO
section contains two papers which address the
cost and productivity issue.
INTRODUCTION: Fab Productivity 2 A challenge for all manufacturing companies
is to maximize the capability of their operations
and to stay cost competitive with newer facilities.
This is especially true in the semiconductor
manufacturing arena where we have historically
experienced rapid progressions in technology
and constant pressure to reduce costs.
Practical Considerations of Implementing R2R Controllers - Part 2: R2R Control Checklist Most semiconductor manufacturers
consider run-to-run (R2R) control a vital
component of high-yielding production.
However, many still consider the development
and implementation of these controllers
as a “black box” process. This paper
is in two parts, wherein Part 1 primarily presented
an overview of common R2R terminology
along with the basics of feedback
and feedforward controllers, and Part 2
provides a detailed analysis on a checklist
to aid the reader in developing and implementing
R2R controllers and thereby
demystify them.
Hidden Gold in Your Manufacturing Facility: It’s All Around You! Psst, hey, want to see ~0.5 to 4 percent
yield improvement in under a year? You’re
missing an easy one! We have spent the past few months
investigating this issue, and detail what we
have learned below. We hope it helps you,
and believe the industry will benefit by
applying what we have learned.
Quality Control
INTRODUCTION: Quality Control Process and yield engineers are always working
near the limits of their ability to measure and
control process variables. Continuous vigilance is
needed to ensure tight physical and electrical
tolerances. This is true for both high-volume
operations, where millions of dollars of product
are in jeopardy; and for development fabs, where
cycles of learning, on a relatively small number
of lots, are the key product.
Electrostatic Discharge Event Detection in Photolithography: A Predictive Maintenance Tool (Part 2 of 2) Equipment engineers can proactively
find and mitigate charged surfaces that
can lead to an ESD event. When it’s ESD –
it’s too late. Part 2 reviews some case studies
of how charge monitoring and ESD
event detection were used in photolithography
equipment. Surface charging was
reduced/eliminated, and overall tool reliability
was improved. Tool lockups from
ESD-induced electromagnetic interference
(EMI, i.e., the 100MHz to 2GHz frequency
radio waves accompanying ESD events)
were reduced.
Matching CD-SEM Tools for Feature Size Measurement Results in a High-Volume Production Operation – Part 1 of 2 This paper describes an approach to
maintaining small biases between CD-SEM
tools for the numerous feature types found
in high-volume production operations. Part 1
focuses on key issues complicating control
of CD-SEM feature measurement, and identifies
a simple statistical model to apply to
production data to facilitate its use in managing
CD-SEM matching. Part 2 focuses on
the specific process control approach utilizing
the model results.
Supply Chain Management
INTRODUCTION: Supply Chain Management In a predominant engineering culture
like semiconductor manufacturing, we are
beholden to new technology and the application
of it. For many of us, it is not uncommon
for advances in supply chain management
to take a backseat to process and
equipment investment in our industry. One
exception to this paradigm has been the
advent of RFID.
RFID in the Supply Chain: Part 1 – Inventory Tracking in Semi-Automated Wafer Fabs Streamlining operations within semiautomated
8” fabs is critical for lowering
wafer cost and staying competitive in an
environment where worldwide manufacturing
capacity is increasingly consolidating.
This article aims to provide insights on the
impact of using RFID technology to improve
lot location tracking within semi-automated
wafer fabs.
Environmental Health & Safety
INTRODUCTION: Environmental Health & Safety As our ability to detect chemicals in the environment
has improved, our awareness of man’s
potential impacts on it has grown with the recognition
that, despite our best efforts, we continue to
find chemicals in the environment and health
impacts that we had not predicted. The shift to
making companies responsible for products both
at end of life and for potential material impacts has
come from legislation driven by a change in regulatory
philosophy called the “precautionary principle.”
Information Management for Environmental Concerns and Regulatory Requirements Global awareness of manufacturing’s
impact on the environment has grown considerably
in recent years. Concerns about
toxic materials affecting Earth’s ecosystem
and humans’ health have prompted governments
to take action. Frequently, that
action comes in the form of legislation
designed to restrict the impact that manufacturing,
use and reclamation of products
have on the environment. Due to the quick
obsolescence of electronic products, and
the current use of potentially harmful materials
in both the manufacturing process and
the products themselves, many of these
new restrictions are aimed directly at the
electronics industry.
Third-Party Considerations
INTRODUCTION: Third-Party Considerations This section of FEO is all about the awareness,
opportunities, information, education, appreciation
and value that third parties can provide.
Guidelines for Protecting Intellectual Property Within Process Equipment IC makers and OEMs in semiconductor
manufacturing have complex intellectual
property (IP) challenges. The high cost of
technology development is driving a megatrend
of sharing expense. But concerns
about IP protection impact the business
strategy of sharing resources and costs,
because semiconductor process equipment
lacks the necessary capabilities to enforce
IP protection, resulting in protection being
implemented only through nondisclosure
agreements. Recognizing this challenge,
ISMI is providing a newly published IP
Protection Guidelines document that presents
a security framework that enables
specification of levels of IP protection that
OEMs can use to develop appropriate
controls in their process equipment.
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