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The semiconductor industry is moving
toward data on demand to monitor the
levels of cleanroom contaminants. A large variety of techniques exist which
may be utilized to provide continuous
monitoring of AMC levels. These analytical
tools need to be cost-effective, compact,
require little operator intervention, be self-calibrating,
and offer multipoint testing, which
is a very tall list of requirements. The following
provides a list of techniques that may begin
to meet some of these requirements.
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