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Litho Track-Induced Charging: Effects, Detection, Reduction & Prevention
(11/20/2008) FEO Issue 5
By Nabil Yazdání, Spansion, Inc.
Gregory Klein, Spansion, Inc.
James Garcia, Spansion, Inc.
Branden Linley, Spansion, Inc.
Stacie Brown, Spansion, Inc.
Dale Sheu, Spansion, Inc.
John Halladay, Spansion, Inc.
Joohwan Yoo, Spansion, Inc.
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Track-induced charging during post-develop rinse at a gate oxide masking step can lead to early breakdown of high voltage gate oxide capacitors, which causes sort yield failure concentrated at the wafer center. The root cause fix for this problem is to lower the charging from the track by reducing rinse time or rinse spin speed.
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